Ion Implantation Simulator FabMeister®-IM
FabMeister-IM is a calculation tool of the impurities distribution after the ion implantation that a device process developer can use easily
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FabMeister-IM is a calculation tool of the impurities distribution. Impurity distribution analysis technique developed by Fujitsu Laboratories Ltd. FabMeister-IM extracts parameters of the analytical function from SIMS data and predict impurities distribution accurately in arbitrary ion implantation conditions. More highly precise ion implantation distribution can get compare with the simulation results such as TRIM(SRIM). Monte Carlo simulation can also use.
Benefits
- Two calculation models:Extract parameter from SIMS data and Monte Carlo simulation.
- Stored about 1,000 SIMS data.
- Display thickness of amorphous layer formed by ion implantation and also calculate diffusion.
- Calculate two dimensional distribution under mask domains such as gate or contact pattern.
- Extended Lindhard-Scharff-Schiott(LSS) theory provides the same accuracy profile as MC simulation in a shorter time.
- Simple operability on Windows.
Specifications
| Model | parameter from SIMS data | Monte Carlo simulation |
|---|---|---|
| substrate material | Si | any |
| calculation models | tail function, Dual Pearson | Monte Carlo, Quasi Crystal Extended LSS |
| ion | Ar,As,B,BF2,C,F,Ge,In,N,P,Sb,S | all |
| substrate type | Si, poly-Si, a-Si, oxide, HFO2, a-Ge, c-Ge Mo, NiSi, Resist | all |
| cover oxide(*) | 0-10nm | none |
| dose(*) | 1e10-5e15 cm² | any |
| energy(*) | 0.5-2,000keV | any |
| Rotation(*) | 0-45o | any |
| Tilt | 0-7o | any |
(*)Ranges are different by implantation ion
Result Examples
 |
 |
| Boron（Si,10keV,1e15 cm-2） as impla and after anneal | As（Si,10keV,1e15cm-2）*gray area is amorphous layer |
As implantation through mask（mask width：0.1um,10keV,1E15cm-2）
Cu distribution in Silicone calculate by Monte Carlo Method
Requirements
OS:Microsoft® Windows® 2000､Microsoft® Windows® XP
Web browser:Microsoft® Internet Explorer
- *FabMeister is a registered trademark of Mizuho Information & Research Institute, Inc.
- *Microsoft® Windows®､Microsoft® Internet Explorer are registered trademarks Microsoft Corporation.
Contact
Department:Science Solutions Division
TEL:+81-3-5281-5311
